Thin solid films grown by physical vapor deposition exhibit diverse characteristic mesoscopic morphologies depending on the dynamical parameters of the deposition process. These universal morphologies have been summarized on successive empirical models known as Structure Zone Models (SZM). The first SZM introduced for physical vapor deposition under simple experimental conditions distinguishes two main characteristic morphology zones obtained by varying the leading deposition parameters, the substrate temperature and the deposition rate. We study in detail the effect of these parameters on the bulk morphologies of films by means of an atomistic mesoscopic simulation model of ballistic aggregation with surface diffusion. Simulation results in two and three dimensions for diverse bonding symmetries are presented.
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